SENTECH is a project partner of the project "Research on highly flexible optical precision layers on polymer surfaces (FlexCoPlas)", which is supported by the funding initiative "Innovative Applications of Plasma Technology" of the German Federal Ministry of Education and Research. Within the three-year project period, an innovative measurement method and measuring device was developed using the technical know-how of SENTECH. Precise control of transmission properties of laye
SENTECH offers an application oriented seminar on the topic “Plasma-Process-Technology” on March 9, 2017 at SENTECH in Berlin Adlershof. We are glad to announce that invited speakers from industry and science will give presentations on plasma etching, PECVD and PEALD and share their experiences with different applications.
SENTECH proudly presents the new spectroscopic ellipsometer SENresearch 4.0.
The SENresearch 4.0 is an innovative ellipsometry solution which features widest spectral ranges and highest spectral resolution. The Step Scan Analyser (SSA) principle is applied for ellipsometric measurement, i.e. there are no moving optical parts during data acquisition for best measurement results.
Beginning from 2015, SENTECH Instruments has a new and stronger partner in Turkey and Middle East region, Fotonika Semiconductor Technologies Incorporated. Established as the successor of Labormed, Fotonika aims to improve SENTECH customers’ experience by providing deeper application and process support.
SENTECH has organized a seminar on Plasma Process Technology on March 5th 2015, held at SENTECH Instruments in Berlin Adlershof. The Seminar was the 10th plasma seminar and attracted more than 50 specialists from industry, research institutions and universities. Aim of the seminar was to bring various user groups from industry and R&D together for networking. Taking the opportunity SENTECH introduced the new ALD Real Time Monitor.
The new ALD Real Time Monitor was presented at the NRW Nano-Conference (1st-2nd of December 2014). This important conference welcomed its guests to participate the dialogue about opportunities and challenges of nanotechnology.
SENTECH new ALD Real Time Monitor was presented in Asia at the 3rd China ALD Conference. For the first time the patented monitor allows the direct monitoring of absorption and desorption processes on the substrate surface during ALD processes within ALD half cycles.
The Technical University Eindhoven as well as the University of Groningen are convinced of SENTECH`s excellent service and the high flexibility of SENTECH plasma systems. Plasma systems SI 500 ICP RIE were purchased with 6 and 5 gas lines, respectively, to cover a variety of applications. Before changing to SENTECH systems both universities had been using etching systems of other manufacturers. After the replacement, both institutions appreciate the quality and flexible performance of the induct
A one day technical plasma seminar was given by SENTECH in Shanghai on June 20th, 2014. The Chinese institute SIMIT (Shanghai Institute of Microsystem and Information Technology) hosted this annual event, which gained the attention of many students, scientists and experts from industry, like it had the previous years.
