Advantest to Showcase E-Beam Lithography Solutions at 42nd Micro and Nano Engineering (MNE) Show in Vienna, Austria on September 19-23

Advantest to Showcase E-Beam Lithography Solutions at 42nd Micro and Nano Engineering (MNE) Show in Vienna, Austria on September 19-23

MUNICH, GERMANY — (Marketwired) — 09/15/16 — Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) will feature its EB (electron beam) lithography system in stand 25 at the 42nd Micro and Nano Engineering Show, taking place September 19-23 at the Reed Messe Wien in Vienna, Austria.The F7000 EB lithography system delivers high throughput and creates very accurate and smooth nano-patterns on wafers from 1X-nm resolutions. Its direct-write technology makes it well-sui

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