SENTECH Seminar on Ellipsometry and Reflectometry 2015

A one day seminar on the topic “Ellipsometry and Reflectometry for the characterization of thin films” was organized by SENTECH in Stuttgart, June 18, 2015. The seminar was focussed on innovations of SENTECH metrology as well as on new developments in science and technology. Invited speakers and SENTECH experts addressed topics from in situ process control, over nanotechnology to photovoltaics.

SENTECH at the ALD China Conference 2014

SENTECH new ALD Real Time Monitor was presented in Asia at the 3rd China ALD Conference. For the first time the patented monitor allows the direct monitoring of absorption and desorption processes on the substrate surface during ALD processes within ALD half cycles.