CNR-IMM Italy uses SI PEALD LL for new high-k materials

CNR-IMM Italy uses SI PEALD LL for new high-k materials

The Institute for Microelectronics and Microsystems (CNR-IMM/1/) in Catania, Italy is using a SI PEALD LL tool with an 8-inch wafer configuration. The research Institute belongs to the Physics and Matter Technologies Department (DSFTM) of the National Reseach Council of Italy (CNR), and has its headquarters in Catania. The integration of novel high-k gate dielectrics and passivating layers on devices based on Gallium Nitride and other wide band gap semiconductors is investigated using SENTECH PE

SENTECH at the ALD China Conference 2014

SENTECH new ALD Real Time Monitor was presented in Asia at the 3rd China ALD Conference. For the first time the patented monitor allows the direct monitoring of absorption and desorption processes on the substrate surface during ALD processes within ALD half cycles.

Major Milestone for Cambridge NanoTech: 300th ALD System Shipped

Major Milestone for Cambridge NanoTech: 300th ALD System Shipped

CAMBRIDGE, MA — (Marketwire) — 02/28/12 — , the world leader in (ALD) science and equipment, has completed delivery of its 300th system to the in Shanxi, China. Marking as a milestone for the company, Cambridge NanoTech-s ALD systems have become an important strategic solution for researchers and manufacturers that require digital control for a variety of materials such as oxides, nitrides, sulfides, and metals.The Institute of Coal Chemistry is a high-tech research and development instit