Mr. Johan Holsten, responsible person for the cleanroom in Groningen, chose SENTECH because of the high end components integrated in SENTECH systems. Mr. Holsten was delighted about the rapid installation and the customer oriented service of SENTECH. Quoting Mr. Holsten: “SENTECH was perfectly able to meet our expectations. We have been especially pleased by the individual optimization of the processes and the performance of the plasma etcher. Other manufacturers aren’t able to react to our individual needs at every time. “
Mr. Holsten is convinced of the performance of his SI 500 ICP RIE and he has recommended SENTECH to his former colleague at TU Eindhoven. Mr. Ambrosius, managing director at the nano lab at TU Eindhoven, purchased a SI 500 ICP RIE because the SI 500 ICP RIE with 5 gas lines solves his plasma etching applications with one chamber. We are looking forward to a great cooperation in the future.
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